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Chemical vapor deposition (CVD) was used to uniformly deposit thin smooth continuous coats of TiC on the fibers of graphite tows. Wet chemical coating of fibers followed by high-temperature treatment was also used but showed little promise as an alternative coating method.
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However the deposition processes for these materials are still under investigation. For example high temperature (>400 C) chemical vapor deposition (CVD) processes confront issues with wafer bowing [169–170]. But the challenges for physical vapor deposition (PVD) are somewhat different.
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Chemical vapor deposition (CVD) has been recently explored for the synthesis of bilayer graphene but usually with limited coverage and a mixture of AB and randomly stacked structures. Herein we report a rational approach to produce large-area high quality AB stacked bilayer graphene.
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It is in crystals 0.2 in (0.005 m) in size agglomerated into particles of about 1 732 in (44 m). It has very high bulking properties and is used also in cosmetics. Sumitomo Chemical can make particles as fine as 12 to 787 in (0.3 to 20 m) from aluminum hydroxide by hightemperature chemical vapor deposition in inert atmosphere.
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In a previous paper it was reported that the preferred crystalline orientation of TiO 2 transferred significantly from (1 1 0) face in starting TiO 2 powders to (1 0 1) and (1 1 1) faces in TiO 2 coating deposited on both stainless steel and glass substrates by plasma-sprayed [J. Mater. Sci. Lett. 17 (1998) 1747]. An understanding of the change in the preferred orientations has remained elusive.
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Optical crystal materials are available as single and polycrystalline forms. The polycrystalline form of a material consists of small randomly oriented individual crystals and are manufactured by various methods such as by hot pressing of powders sintering and chemical vapor deposition.
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To address this atomic layer deposition (ALD) of CdTe with metal organic chemical vapor deposition (MOCVD) is being evaluated to conformally coat the sidewalls of deep dry-etched devices.
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so high that it will degrade the photochemical properties of the resist. Had the high-temperature hardbake been employed prior to the development step the resist would not have developed properly. Consequently the hardbake is one of the last steps in the lithography process though it may precede measurement and inspection.
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as 12 to 787 in (0.3 to 20 m) from aluminum hydroxide by high-temperature chemical vapor deposition in inert atmosphere. Alumina ceramics are the most widely used oxide-type ceramic chiefly because alumina is plentiful relatively low-cost and equal to or better than most oxides in mechanical properties. Density can be var-
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